Regularities of remote plasma enhanced chemical vapor deposition of silicon nitride films
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Published:2015-05
Issue:5
Volume:85
Page:1238-1251
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ISSN:1070-3632
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Container-title:Russian Journal of General Chemistry
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language:en
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Short-container-title:Russ J Gen Chem
Publisher
Pleiades Publishing Ltd
Subject
General Chemistry
Reference28 articles.
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