The reactions of silane in the afterglow of a helium–nitrogen plasma
Author:
Publisher
IOP Publishing
Subject
Condensed Matter Physics
Reference55 articles.
1. A comparative study on inductively-coupled plasma high-density plasma, plasma-enhanced, and low pressure chemical vapor deposition silicon nitride films
2. Separate and independent reductions in direct tunneling in oxide/nitride stacks with monolayer interface nitridation associated with the (i) interface nitridation and (ii) increased physical thickness
3. Remote plasma-enhanced chemical vapour deposition of silicon nitride at atmospheric pressure
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