Influence of the Argon Pressure at dc Magnetron Sputtering on Contaminations in CrSi Thin Films
Author:
Publisher
Wiley
Subject
Condensed Matter Physics
Reference43 articles.
1. Kathodenzerstäubung und ihre Anwendung in der Dünnschichttechnologie
2. Magnetron sputtering deposited AIN waveguides: effect of the structure on optical properties
3. NbN thin films reactively sputtered with a high‐field direct‐current magnetron
4. Developments and trends in sputtering deposition techniques
5. Correlations between sputtering parameters, composition and resistivity of granular NbN films
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