To the Kinetics of Nitrogen Incorporation during dc Magnetron Deposition-Reference-Cited by-同舟云学术

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To the Kinetics of Nitrogen Incorporation during dc Magnetron Deposition

Published:1994 Issue:1 Volume:34 Page:81-97
ISSN:0863-1042
Container-title:Contributions to Plasma Physics
language:en
Short-container-title:Contrib. Plasma.Phys.

Author:

Sobe G.

Publisher

Wiley

Subject

Condensed Matter Physics

Reference59 articles.

1. Early days of magnetron sputtering—an enigma

2. Res./Dev. (25/1) 37 (1974).

3. in: , Fizika i Primenenie Plazmennych Uskoritelej, Isdatjelstvo Nauka i technika, Minsk 1974, p. 330.

4. R.F. reactively sputtered TiN: Characterization and adhesion to materials of technical interest

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Investigation of the mechanisms of magnetron sputtering of aluminium with mixtures of argon and nitrogen in the partially reactive mode;Surface and Coatings Technology;1997-12

2. A Linear Model for the Interpretation of Optical Emission Spectroscopy Measurements in Low Pressure DC Magnetron Sputtering;Contributions to Plasma Physics;1997

3. Partially reactive d.c. magnetron sputtering — a key to new understanding of reactive plasma sputter deposition?;Surface and Coatings Technology;1995-09

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