Partially reactive d.c. magnetron sputtering — a key to new understanding of reactive plasma sputter deposition?
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference14 articles.
1. Hysteresis effect in reactive sputtering: a problem of system stability
2. Reactive magnetron sputter deposition of niobium nitride films
3. Reactive unbalanced magnetron sputtering of the nitrides of Ti, Zr, Hf, Cr, Mo, Ti-Al, Ti-Zr and Ti-Al-V
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Triode magnetron sputtering TiN film deposition;Surface and Coatings Technology;1999-04
2. Magnetron sputtering of aluminium using oxygen or nitrogen as reactive gas;Thin Solid Films;1998-07
3. Investigation of the mechanisms of magnetron sputtering of aluminium with mixtures of argon and nitrogen in the partially reactive mode;Surface and Coatings Technology;1997-12
4. Properties of reactively RF magnetron-sputtered chromium nitride coatings;Surface and Coatings Technology;1997-11
5. A Linear Model for the Interpretation of Optical Emission Spectroscopy Measurements in Low Pressure DC Magnetron Sputtering;Contributions to Plasma Physics;1997
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