Tungsten hexacarbonyl and hydrogen peroxide as precursors for the growth of tungsten oxide thin films on titania nanoparticles-Reference-Cited by-同舟云学术

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Tungsten hexacarbonyl and hydrogen peroxide as precursors for the growth of tungsten oxide thin films on titania nanoparticles

Published:2014-02-19 Issue:4 Volume:60 Page:1278-1286
ISSN:0001-1541
Container-title:AIChE Journal
language:en
Short-container-title:AIChE J.

Author:

Jackson David H. K.¹,Dunn Bryan A.¹,Guan Yingxin¹,Kuech Thomas F.¹

Affiliation:

1. Dept. of Chemical and Biological Engineering; University of Wisconsin-Madison; Madison WI 53706

Funder

Institute for Atom-Efficient Chemical Transformations (IACT), an Energy Frontier Research Center

U.S. Department of Energy, Office of Science, Office of Basic Energy Sciences

University of Wisconsin Materials Research Science and Engineering Center

Publisher

Wiley

Subject

General Chemical Engineering,Environmental Engineering,Biotechnology

Reference37 articles.

1. Surface chemistry of atomic layer deposition: a case study for the trimethylaluminum/water process;Puurunen;J Appl Phys,2005

2. Emerging applications of atomic layer deposition for lithium-ion battery studies;Meng;Adv Mater. 17,2012

3. Surface modifications of electrode materials for lithium ion batteries;Fua;Solid State Sci,2006

4. Coking- and sintering-resistant palladium catalysts achieved through atomic layer deposition;Lu;Science,2012

5. Spatial atomic layer deposition: a route towards further industrialization of atomic layer deposition;Poodt;J Vac Sci Technol A,2012

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4. Electrochemically active dispersed tungsten oxides obtained from tungsten hexacarbonyl in supercritical carbon dioxide;Journal of Materials Science;2019-04-04

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