Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition-Reference-Cited by-同舟云学术

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Spatial atomic layer deposition: A route towards further industrialization of atomic layer deposition

Published:2012-01 Issue:1 Volume:30 Page:010802
ISSN:0734-2101
Container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
language:en
Short-container-title:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films

Author:

Poodt Paul,Cameron David C.,Dickey Eric,George Steven M.,Kuznetsov Vladimir,Parsons Gregory N.,Roozeboom Fred,Sundaram Ganesh,Vermeer Ad

Publisher

American Vacuum Society

Subject

Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Link

http://avs.scitation.org/doi/pdf/10.1116/1.3670745

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