Some Insights into Atomic Layer Deposition of MoNx Using Mo(CO)6 and NH3 and Its Diffusion Barrier Application
Author:
Affiliation:
1. School of Materials Science and Engineering, Yeungnam University, Gyeongsan, Gyeongbuk 38541, Republic of Korea
2. Department of Chemical Engineering, Hongik University, Mapo-gu, Seoul 04066, Republic of Korea
Funder
Ministry of Trade, Industry and Energy
Korea Semiconductor Research Consortium
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,General Chemical Engineering,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.chemmater.9b01578
Reference68 articles.
1. Advanced Interconnects: Materials, Processing, and Reliability
2. Progress in the development and understanding of advanced low k and ultralow k dielectrics for very large-scale integrated interconnects—State of the art
3. Copper Metallization for High Performance Silicon Technology
4. Copper deposition and thermal stability issues in copper-based metallization for ULSI technology
5. The formation of Cu3Si: Marker experiments
Cited by 19 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Low-resistivity molybdenum-carbide thin films formed by thermal atomic layer deposition with pressure-assisted decomposition reaction;Journal of Vacuum Science & Technology A;2024-06-25
2. Boosted Reaction Kinetics of Li–CO2 Batteries by Atomic Layer-Deposited Mo2N on Hydrogen Substituted Graphdiyne;ACS Sustainable Chemistry & Engineering;2023-10-30
3. Chemical conversion of MoS2 thin films deposited by atomic layer deposition (ALD) into molybdenum nitride monitored by in situ reflectance measurements;Journal of Vacuum Science & Technology A;2023-07-31
4. Atomic layer deposition of thin films: from a chemistry perspective;International Journal of Extreme Manufacturing;2023-06-14
5. Factors Effecting and Structural Engineering of Molybdenum Nitride‐Based Electrocatalyst for Overall Water Splitting: A Critical Review;Energy Technology;2023-05-31
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3