Chemistry of Plasma-Polymerized Vinyltriethoxysilane Controlled by Deposition Conditions
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Reference36 articles.
1. Electrical Properties of Low-Dielectric-Constant SiOC(–H) Films Prepared by Plasma-Enhanced Chemical Vapor Deposition from Methyltriethoxysilane and O2
2. Microstructural Evolution of Thermally Treated Low-Dielectric Constant SiOC:H Films Prepared by PECVD
3. Investigation of low dielectric carbon-doped silicon oxide films prepared by PECVD using methyltrimethoxysilane precursor
4. Oxygen and water vapor gas barrier poly(ethylene naphthalate) films by deposition of SiOx plasma polymers from mixture of tetramethoxysilane and oxygen
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