Preliminary Synthesis of Carbon Nitride Thin Films by N2/CH4 Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and the Obtained Films-Reference-Cited by-同舟云学术

Preliminary Synthesis of Carbon Nitride Thin Films by N2/CH4 Microwave Plasma Assisted Chemical Vapour Deposition: Characterisation of the Discharge and the Obtained Films

Published:2007-04 Issue:S1 Volume:4 Page:S210-S214
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Kouakou Paul,Brien Valérie,Assouar Badreddine,Hody Virginie,Belmahi Mohammed,Migeon Henri N.,Bougdira Jamal

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

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2. Hard coatings for mechanical applications

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4. Structure and properties of pulsed-laser deposited carbon nitride thin films

5. Optical and structural properties of the amorphous carbon nitride by ECR-plasma

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