Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2 /N2 /Ar/Hexamethyldisilazane Gas Mixture-Reference-Cited by-同舟云学术

Microwave Plasma Process for SiCN:H Thin Films Synthesis with Composition Varying from SiC:H to SiN:H in H2 /N2 /Ar/Hexamethyldisilazane Gas Mixture

Published:2014-03-19 Issue:6 Volume:11 Page:551-558
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Belmahi Mohammed¹²,Bulou Simon³,Thouvenin Amanda¹²,de Poucques Ludovic¹²,Hugon Robert¹²,Le Brizoual Laurent⁴⁵,Miska Patrice¹²,Genève Damien¹²,Vasseur Jean-Luc¹²,Bougdira Jamal¹²

Affiliation:

1. Université de Lorraine, Institut Jean Lamour UMR 7198; Faculté des Sciences et Technologies; BP 70239 F-54506 Vandoeuvre-lès-Nancy Cedex France

2. Centre National de la Recherche Scientifique; Institut Jean Lamour UMR 7198; Faculté des Sciences et Technologies; BP 70239 F-54506 Vandoeuvre-lès-Nancy Cedex France

3. Centre de Recherches Public Gabriel Lippmann; 41 rue du Brill L-4422 Belvaux Luxembourg

4. Université de Nantes; Institut des Matériaux Jean Rouxel CNRS UMR 6502; 2 rue de la Houssinière, B.P. 32229 F-44322 Nantes Cedex 3 France

5. Université de Rennes 1; Institut d'Electronique et Telecommunications de Rennes; UMR CNRS 6164, Campus Beaulieu - bât. 11D, 263 ave. du Général Leclerc, CS 74205 35042 Rennes Cedex France

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201300166/fullpdf

Reference46 articles.

1. Reactive magnetron sputtering of Si–C–N films with controlled mechanical and optical properties

2. Characteristics of Si$z.sbnd;C$z.sbnd;N films deposited by microwave plasma CVD on Si wafers with various buffer layer materials

3. Silicon Carbonitride Films by Remote Hydrogen-Nitrogen Plasma CVD from a Tetramethyldisilazane Source

4. Remote hydrogen microwave plasma chemical vapor deposition of silicon carbonitride films from a (dimethylamino)dimethylsilane precursor: Compositional and structural dependencies of film properties

5. Silicon carbonitride thin-film coatings fabricated by remote hydrogen–nitrogen microwave plasma chemical vapor deposition from a single-source precursor: Growth process, structure, and properties of the coatings

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