Effect of water-contact on the roughness of patterned photoresist investigated by AFM analysis
Author:
Publisher
Wiley
Subject
Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry
Reference12 articles.
1. The future of subhalf-micrometer optical lithography
2. Fabrication of 0.2 µm Fine Patterns Using Optical Projection Lithography with an Oil Immersion Lens
3. Immersion liquids for lithography in the deep ultraviolet
4. Liquid immersion lithography: evaluation of resist issues
5. Moisture Absorption and Absorption Kinetics in Polyelectrolyte Films: Influence of Film Thickness
Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Combinatorial Optimization of a Molecular Glass Photoresist System for Electron Beam Lithography;Advanced Materials;2011-10-18
2. Effect of Water Contact on the Density Distributions of Thin Supported Polymer Films Investigated by an X-ray Reflectivity Method;Langmuir;2010-11-10
3. Vertical Density Profiles of Various Photoresists and Top-coats by X-ray Reflectivity Analysis;Journal of Photopolymer Science and Technology;2009
4. Real-time studies of surface roughness development and reticulation mechanism of advanced photoresist materials during plasma processing;Journal of Applied Physics;2009-01
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