Balancing Block Copolymer Thickness over Template Density in Graphoepitaxy Approach-Reference-Cited by-同舟云学术

Balancing Block Copolymer Thickness over Template Density in Graphoepitaxy Approach

Published:2017-09-12 Issue:11 Volume:302 Page:1700285
ISSN:1438-7492
Container-title:Macromolecular Materials and Engineering
language:en
Short-container-title:Macromol. Mater. Eng.

Author:

Barros Patricia Pimenta¹,Gharbi Ahmed¹,Fouquet Antoine¹,Bos Sandra¹,Hazart Jérôme¹,Delachat Florian¹,Chevalier Xavier²,Cayrefourcq Ian²,Pain Laurent¹,Tiron Raluca¹

Affiliation:

1. CEA-LETI; 17 Rue des Martyrs 38054 Grenoble France

2. ARKEMA FRANCE; Route Nationale 117, BP34 64170 Lacq France

Funder

H2020 European Research Council

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Organic Chemistry,General Chemical Engineering

Reference38 articles.

1. Block Copolymer Based Nanostructures: Materials, Processes, and Applications to Electronics

2. Simple and Versatile Methods To Integrate Directed Self-Assembly with Optical Lithography Using a Polarity-Switched Photoresist

3. The potential of block copolymer’s directed self-assembly for contact hole shrink and contact multiplication

4. Two-Dimensional Pattern Formation Using Graphoepitaxy of PS-b-PMMA Block Copolymers for Advanced FinFET Device and Circuit Fabrication

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