Surface Damage and Copper Precipitation in Silicon
Author:
Publisher
Wiley
Subject
Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference7 articles.
1. A Metallographic Investigation of the Damaged Layer in Abraded Germanium Surfaces
2. Etching of Abraded Germanium Surfaces with CP-4 Reagent
3. Surface damage on abraded silicon specimens
4. e. g. Dislocations and Mechanical Properties of Crystals, S. Wiley and Sons (p. 57).
5. A kinematical theory of diffraction contrast of electron transmission microscope images of dislocations and other defects
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