Preparation of acid-cleavable branched polymers for argon fluoride photoresists via reversible addition-fragmentation chain-transfer polymerization-Reference-Cited by-同舟云学术

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Preparation of acid-cleavable branched polymers for argon fluoride photoresists via reversible addition-fragmentation chain-transfer polymerization

Published:2011-12-19 Issue:1 Volume:125 Page:344-352
ISSN:0021-8995
Container-title:Journal of Applied Polymer Science
language:en
Short-container-title:J. Appl. Polym. Sci.

Author:

Sohn Hae-Sung,Kim Dong-Gyun,Lee Aeri,Lee Jae-Woo,Kim Jeong-Sik,Kim Jae-Hyun,Lee Jong-Chan

Publisher

Wiley

Subject

Materials Chemistry,Polymers and Plastics,Surfaces, Coatings and Films,General Chemistry

Reference36 articles.

1. Chemical Amplification Resists for Microlithography

2. Synthesis and characterization of norbornene-based polymers with 7,7-dimethyloxepan-2-one acid labile groups for chemically amplified photoresists

3. Hyperbranched Polymers for Photolithographic Applications - Towards Understanding the Relationship between Chemical Structure of Polymer Resin and Lithographic Performances

4. Chemically amplified photoresists for 193-nm photolithography: Effect of molecular structure and photonic parameters on photopatterning

5. Varanasi , P. R. Katnani , A. D. Khojasteh , M. M. 2000

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3. Novel Star Polymers as Chemically Amplified Positive-Tone Photoresists for KrF Lithography Applications;Industrial & Engineering Chemistry Research;2018-04-27

4. Synthesis of Narrow Molecular Weight Distribution Copolymers for ArF Photoresist Materials by Nitroxide Mediated Polymerization;Macromolecular Reaction Engineering;2016-08-22

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