Summary of ISO/TC 201 Standard: IV ISO 14606:2000?Surface chemical analysis?Sputter depth profiling?Optimization using layered systems as reference materials-Reference-Cited by-同舟云学术

Summary of ISO/TC 201 Standard: IV ISO 14606:2000?Surface chemical analysis?Sputter depth profiling?Optimization using layered systems as reference materials

Published:2002 Issue:4 Volume:33 Page:365-366
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Kajiwara K.

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference8 articles.

1. ASTM E 1438-91. Standard Guide for Measuring, Widths of Interfaces in Sputter Depth Profiling Using SIMS. ASTM: Philadelphia, PA, 1996.

2. ASTM E 1127-91. Standard Guide for Depth Profiling in Auger Electron Spectroscopy. ASTM: Philadelphia, PA, 1997.

3. Resolution in sputter depth profiling assessed by AlAs/GaAs superlattices

4. ISO Guide 30:1992. Terms and Definitions used in Connection with Reference Materials.

5. ISO Guide 31:1981. Contents of Certificates of Reference Materials.

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