Ultra low energy O2 + SIMS depth profiling of superficial poly(CuPc) and Co(II)T(o-NH2)PP monomolecular layers-Reference-Cited by-同舟云学术

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Ultra low energy O2 + SIMS depth profiling of superficial poly(CuPc) and Co(II)T(o-NH2)PP monomolecular layers

Published:2012-05-24 Issue:1 Volume:45 Page:324-328
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Dowsett M. G.¹,Morris R. J. H.¹,Adriaens A.²,Wilson N. R.¹

Affiliation:

1. University of Warwick; Gibbet Hill Road Coventry CV4 7AL UK

2. Ghent University; Krijgslaan 281 S12 B9000 Ghent Belgium

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/sia.5039/fullpdf

Reference16 articles.

1. Depth profiling using ultra-low-energy secondary ion mass spectrometry

2. Apparent and real transient effects in SIMS depth profiling using oxygen bombardment

3. On the reliability of SIMS depth profiles through HfO2-stacks

4. Quantification of nitrogen profiles in HfSiON films for gate dielectrics

5. Quantitative analysis of the top 5 nm of boron ultra-shallow implants

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