HVPE Growth of GaN on a GaN Templated (111) Si Substrate
Author:
Affiliation:
1. Department of Electronics, Nagoya University, Chikusa‐ku, Nagoya 464‐8603, Japan
Publisher
Wiley
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssc.200390001
Reference9 articles.
1. InGaN/GaN/AlGaN-based laser diodes with modulation-doped strained-layer superlattices grown on an epitaxially laterally overgrown GaN substrate
2. Thick GaN Epitaxial Growth with Low Dislocation Density by Hydride Vapor Phase Epitaxy
3. Growth of Bulk GaN Single Crystals by the Pressure-Controlled Solution Growth Method
4. Large Free-Standing GaN Substrates by Hydride Vapor Phase Epitaxy and Laser-Induced Liftoff
5. High Quality GaN Layers Grown by Metalorganic Chemical Vapor Deposition on Si(111) Substrates
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Characterization of AlGaN layer with high Al content grown by mixed-source HVPE;physica status solidi (a);2005-05
2. Optical and electrical properties of (1-101)GaN grown on a 7° off-axis (001)Si substrate;Applied Physics Letters;2004-06-07
3. HVPE growth of a thick GaN layer on a GaN templated (111) Si substrate;physica status solidi (c);2003-11-24
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