Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing-Reference-Cited by-同舟云学术

Triangular Elastomeric Stamps for Optical Applications: Near-Field Phase Shift Photolithography, 3D Proximity Field Patterning, Embossed Antireflective Coatings, and SERS Sensing

Published:2012-04-12 Issue:14 Volume:22 Page:2927-2938
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Bowen Audrey M.,Motala Michael J.,Lucas J. Matthew,Gupta Sidhartha,Baca Alfred J.,Mihi Agustin,Alivisatos A. Paul,Braun Paul V.,Nuzzo Ralph G.

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Reference79 articles.

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