Morphology and Wettability Control of Silicon Cone Arrays Using Colloidal Lithography-Reference-Cited by-同舟云学术

Morphology and Wettability Control of Silicon Cone Arrays Using Colloidal Lithography

Published:2009-03-17 Issue:13 Volume:25 Page:7375-7382
ISSN:0743-7463
Container-title:Langmuir
language:en
Short-container-title:Langmuir

Author:

Zhang Xuemin¹,Zhang Junhu¹,Ren Zhiyu¹²,Li Xiao¹,Zhang Xun¹,Zhu Difu¹,Wang Tieqiang¹,Tian Tian¹,Yang Bai¹

Affiliation:

1. Key Laboratory for Supramolecular Structure and Materials, College of Chemistry, Jilin University, Changchun 130012, People's Republic of China

2. Key Laboratory of Functional Inorganic Material Chemistry, Ministry of Education, Laboratory of Physical Chemistry, School of Chemistry and Materials Science, Heilongjiang University, Harbin 150080, People’s Republic of China

Publisher

American Chemical Society (ACS)

Subject

Electrochemistry,Spectroscopy,Surfaces and Interfaces,Condensed Matter Physics,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/la900258e

Reference52 articles.

1. Nanotips: Growth, Model, and Applications

2. Improved broadband and quasi-omnidirectional anti-reflection properties with biomimetic silicon nanostructures

3. A Novel Silicon Nanotips Antireflection Surface for the Micro Sun Sensor

4. Bioinspired Self-Cleaning Antireflection Coatings

5. Recent progress in field emitter array development for high performance applications

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