Strain Relaxation of Monolayer WS 2 on Plastic Substrate-Reference-Cited by-同舟云学术

Strain Relaxation of Monolayer WS 2 on Plastic Substrate

Published:2016-10-26 Issue:47 Volume:26 Page:8707-8714
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Zhang Qianhui¹,Chang Zhenyue²,Xu Guanzhong¹,Wang Ziyu³,Zhang Yupeng³,Xu Zai‐Quan³,Chen Shujian¹,Bao Qiaoliang³⁴⁵,Liu Jefferson Zhe²,Mai Yui‐Wing⁶,Duan Wenhui¹⁴,Fuhrer Michael S.⁴,Zheng Changxi¹⁴

Affiliation:

1. Department of Civil Engineering Monash University Clayton VIC 3800 Australia

2. Department of Mechanical Engineering Monash University Clayton VIC 3800 Australia

3. Department of Materials Science and Engineering Monash University Clayton VIC 3800 Australia

4. Monash Centre for Atomically Thin Materials Monash University Clayton VIC 3800 Australia

5. Institute of Functional Nano and Soft Materials (FUNSOM) and Collaborative Innovation Center of Suzhou Nano Science and Technology Soochow University Suzhou 215123 P. R. China

6. Centre for Advanced Materials Technology (CAMT) School of Aerospace, Mechanical and Mechatronic Engineering J07 The University of Sydney Sydney NSW 2006 Australia

Funder

Australian Research Council

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/adfm.201603064

Reference34 articles.

1. Atomically ThinMoS2: A New Direct-Gap Semiconductor

2. Elastic Properties of Freely Suspended MoS2Nanosheets

3. Elastic Properties of Chemical-Vapor-Deposited Monolayer MoS2, WS2, and Their Bilayer Heterostructures