Using Directed Self Assembly of Block Copolymer Nanostructures to Modulate Nanoscale Surface Roughness: Towards a Novel Lithographic Process-Reference-Cited by-同舟云学术

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Using Directed Self Assembly of Block Copolymer Nanostructures to Modulate Nanoscale Surface Roughness: Towards a Novel Lithographic Process

Published:2012-08-22 Issue:2 Volume:23 Page:173-183
ISSN:1616-301X
Container-title:Advanced Functional Materials
language:en
Short-container-title:Adv. Funct. Mater.

Author:

Chuang Ya-Mi,Jack Kevin S.,Cheng Han-Hao,Whittaker Andrew K.,Blakey Idriss

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

Reference76 articles.

1. How Surface Topography Relates to Materials' Properties

2. Biologically Inspired Surfaces: Broadening the Scope of Roughness**

3. Controlling Adhesion Force by Means of Nanoscale Surface Roughness

4. Hydrophobicity, Adhesion, and Friction Properties of Nanopatterned Polymers and Scale Dependence for Micro- and Nanoelectromechanical Systems

5. A review on self-cleaning coatings

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1. Membrane Surface Functionalization with Imidazole Derivatives to Benefit Dye Removal and Fouling Resistance in Forward Osmosis;ACS Applied Materials & Interfaces;2021-01-29

2. Block copolymer line roughness and annealing kinetics as a function of chain stiﬀness;Advances in Patterning Materials and Processes XXXVI;2019-03-25

3. Effect of homopolymer concentration on LER and LWR in block copolymer/homopolymer blends;Novel Patterning Technologies 2018;2018-04-04

4. Polyelectrolyte multilayer-like films from layer-by-layer processing of protected polyampholytic block copolymers;Chemical Communications;2018

5. Healing surface roughness of lithographic nanopatterns through sub-10 nm aqueous-dispersible polymeric particles with excellent dry etch durability;Molecular Systems Design & Engineering;2018

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