Healing surface roughness of lithographic nanopatterns through sub-10 nm aqueous-dispersible polymeric particles with excellent dry etch durability-Reference-Cited by-同舟云学术

Healing surface roughness of lithographic nanopatterns through sub-10 nm aqueous-dispersible polymeric particles with excellent dry etch durability

Published:2018 Issue:4 Volume:3 Page:627-635
ISSN:2058-9689
Container-title:Molecular Systems Design & Engineering
language:en
Short-container-title:Mol. Syst. Des. Eng.

Author:

Jiang Zhen¹²³⁴⁵,Cheng Han-Hao⁶²³⁴,Blakey Idriss¹²³⁴⁷^ORCID,Whittaker Andrew K.¹²³⁴⁵^ORCID

Affiliation:

1. Australian Institute for Bioengineering and Nanotechnology

2. The University of Queensland

3. St Lucia

4. Australia

5. ARC Centre of Excellence in Convergent Bio-Nano Science and Technology

6. Australian National Fabrication Facility Queensland Node

7. Centre for Advanced Imaging

Abstract

Herein we demonstrate the design and use of sub-10 nm etch-durable polymeric particles for healing roughness in lithographic patterns.

Funder

Australian Research Council

University of Queensland

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,Industrial and Manufacturing Engineering,Process Chemistry and Technology,Energy Engineering and Power Technology,Biomedical Engineering,Chemical Engineering (miscellaneous),Chemistry (miscellaneous)

Link

http://pubs.rsc.org/en/content/articlepdf/2018/ME/C8ME00007G

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5. Advances in Patterning Materials for 193 nm Immersion Lithography

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