Effect of homopolymer concentration on LER and LWR in block copolymer/homopolymer blends

Author:

Breaux Caleb L.,Delony Jakin B.,Ludovice Peter J.,Henderson Clifford L.

Publisher

SPIE

Reference17 articles.

1. Sub-5 nm Domains in Ordered Poly(cyclohexylethylene)-block-poly(methyl methacrylate) Block Polymers for Lithography

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3. Small-angle x-ray scattering from bulk block polymers in disordered state. estimation of chi-values from accidental thermal fluctuations;Mori,1985

4. Ps-b-phema: synthesis, characterization, and processing of a high chi polymer for directed self-assembly lithography;Cheng,2013

5. Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly

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