The Limits of Lamellae-Forming PS-b-PMMA Block Copolymers for Lithography
Author:
Affiliation:
1. HGST, A Western Digital Company, San Jose Research Center, 3403 Yerba Buena Road, San Jose, California 95135, United States
2. EMD Performance Materials Corp., 70 Meister Avenue, Somerville, New Jersey 08876, United States
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsnano.5b02613
Reference50 articles.
1. International Technology Roadmap for Semiconductors.http://www.itrs.net/home.html, accessed May 2015.
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4. Directed Block Copolymer Assembly versus Electron Beam Lithography for Bit-Patterned Media with Areal Density of 1 Terabit/inch2 and Beyond
5. A Novel Approach to Addressable 4 Teradot/in.2Patterned Media
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