Atomic Layer Deposition and Characterization of Dysprosium-Doped Zirconium Oxide Thin Films-Reference-Cited by-同舟云学术

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Atomic Layer Deposition and Characterization of Dysprosium-Doped Zirconium Oxide Thin Films

Published:2015-09 Issue:7-8-9 Volume:21 Page:181-187
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Tamm Aile¹,Kozlova Jekaterina¹,Arroval Tõnis¹,Aarik Lauri¹,Ritslaid Peeter¹,García Hector²,Castán Helena²,Dueñas Salvador²,Kukli Kaupo¹³,Aarik Jaan¹

Affiliation:

1. Institute of Physics; University of Tartu; Ravila 14c Tartu 50411 Estonia

2. Department of Electronics; University of Valladolid; Campus Miguel Delibes 47011 Valladolid Spain

3. University of Helsinki; Department of Chemistry; University of Helsinki; P.O. Box 55 FIN-00014 Finland

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.201507170/fullpdf

Reference28 articles.

1. Higher permittivity rare earth doped HfO2 for sub-45-nm metal-insulator-semiconductor devices

2. K. Y. Ahn L. Forbes US Patent

3. Microstructures and optical properties of nanocrystalline rare earth stabilized zirconia thin films deposited by a simple sol–gel method

4. Structural and electrical properties of HfO2/Dy2O3 gate stacks on Ge substrates

5. Luminescent properties of ZrO2:Dy3+ and ZrO2:Dy3++Li+ films synthesized by an ultrasonic spray pyrolysis technique

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1. A new way to tune photocatalytic activity, surface morphology, and structural/optical parameters of ZrO2 thin films using different Zr sources along with annealing temperature and film thickness;Journal of Sol-Gel Science and Technology;2024-09-09

2. Atomic and Molecular Layer Deposition of Functional Thin Films Based on Rare Earth Elements;Advanced Materials Interfaces;2024-08-23

3. Interface State Reduction by Plasma-Enhanced Atomic Layer Deposition of Homogeneous Ternary Oxides;ACS Applied Materials & Interfaces;2020-08-31

4. Atomic layer deposition of zirconium oxide thin films;Journal of Materials Research;2019-11-08

5. Low temperature atomic layer deposition of zirconium oxide for inkjet printed transistor applications;RSC Advances;2019

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