Numerical Modeling of the Droplet Vaporization for Design and Operation of Liquid-pulsed CVD
Author:
Affiliation:
1. Univ. Grenoble Alpes, SIMAP; F-38000 Grenoble France
2. CNRS, SIMAP; F-38000 Grenoble France
3. Department of Mechanical Engineering; Univ. of Canterbury; Christchurch New Zealand
Publisher
Wiley
Subject
Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry
Reference20 articles.
1. A. C. Jones M. L. Hitchman 2009
2. Experimental Characterization and Modeling of Pulsed MOCVD with Ultrasonic Atomization of Liquid Precursor
3. Expansion transport regime in pulsed-pressure chemical vapor deposition
4. Development of a model for high precursor conversion efficiency pulsed-pressure chemical vapor deposition (PP-CVD) processing
5. Kinetic model of low pressure film deposition from single precursor vapor in a well-mixed, cold-wall reactor
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