Kinetic model of low pressure film deposition from single precursor vapor in a well-mixed, cold-wall reactor
Author:
Publisher
Elsevier BV
Subject
Metals and Alloys,Polymers and Plastics,Ceramics and Composites,Electronic, Optical and Magnetic Materials
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1. Chemical Vapor Deposition Principles and Applications;Jensen,1993
2. Real-Time Physiconeural Solutions for MOCVD
3. Reaction analysis for ZrO2 and Y2O3 thin film growth by low-pressure metalorganic chemical vapor deposition using β-diketonate complexes
4. Kinetics of Low‐Pressure Chemical Vapor Deposition of TiO2 from Titanium Tetraisopropoxide
5. Kinetic and mechanistic study of the chemical vapor deposition of titanium dioxide thin films using tetrakis‐(isopropoxo)‐titanium(IV)
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