Novel back-channel-etch process flow based a-IGZO TFTs for circuit and display applications on PEN foil
Author:
Affiliation:
1. Imec; Kapeldreef 75 3001 Leuven Belgium
2. ESAT; Katholieke Universiteit Leuven; Kasteelpark Arenberg 10 3001 Leuven Belgium
3. Holst Centre; High Tech Campus 31 5656 AE Eindhoven The Netherlands
Funder
European Community's Seventh Framework Program
Publisher
Wiley
Subject
Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Link
http://onlinelibrary.wiley.com/wol1/doi/10.1002/jsid.189/fullpdf
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2. Review of recent developments in amorphous oxide semiconductor thin film transistor devices;Park;Thin Solid Films,2012
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4. Processing effects on the stability of amorphous indium gallium zinc oxide thin-film transistors;Chiang;J. Non-Cryst. Solids,2008
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