Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry-Reference-Cited by-同舟云学术

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Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry

Published:2008-10-02 Issue:19 Volume:20 Page:3728-3733
ISSN:0935-9648
Container-title:Advanced Materials
language:en
Short-container-title:Adv. Mater.

Author:

Campos Luis M.,Meinel Ines,Guino Rosette G.,Schierhorn Martin,Gupta Nalini,Stucky Galen D.,Hawker Craig J.

Publisher

Wiley

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Reference31 articles.

1. New Approaches to Nanofabrication: Molding, Printing, and Other Techniques

2. Unconventional Methods for Fabricating and Patterning Nanostructures

3. Imprint Lithography with 25-Nanometer Resolution

4. Complex Optical Surfaces Formed by Replica Molding Against Elastomeric Masters

5. Micro- and Nanopatterning Techniques for Organic Electronic and Optoelectronic Systems

Cited by 196 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Metal-Free Click-Chemistry: A Powerful Tool for Fabricating Hydrogels for Biomedical Applications;Bioconjugate Chemistry;2024-03-22

2. Recent progress in bio-inspired macrostructure array materials with special wettability—from surface engineering to functional applications;International Journal of Extreme Manufacturing;2023-11-10

3. Active, Tunable, and Reconfigurable Nanophotonics;Integrated Nanophotonics;2023-06-02

4. Exceptional Light Sensitivity by Thiol–Ene Click Lithography;Journal of the American Chemical Society;2023-01-10

5. The Use of the Thiol-Ene Addition Click Reaction in the Chemistry of Organosilicon Compounds: An Alternative or a Supplement to the Classical Hydrosilylation?;Polymers;2022-07-29

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