Room‐Temperature, Low‐Pressure Nanoimprinting Based on Cationic Photopolymerization of Novel Epoxysilicone Monomers
Author:
Affiliation:
1. Department of Electrical Engineering and Computer Science, The University of Michigan, 1301 Beal Ave., Ann Arbor, MI 48109, USA
2. Dow Corning Corporation, Midland, MI 48686, USA
Publisher
Wiley
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Link
https://onlinelibrary.wiley.com/doi/pdf/10.1002/adma.200401192
Reference37 articles.
1. Imprint Lithography with 25-Nanometer Resolution
2. Imprint of sub‐25 nm vias and trenches in polymers
3. Recent progress in nanoimprint technology and its applications
4. Step and flash imprint lithography: a new approach to high-resolution patterning
5. Sub-10 nm imprint lithography and applications
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