Iridium CVD using di-Âµ-Chloro-tetrakis(trifluorophosphine)- diiridium (I) Precursor, in-situ generated from Chlorotetrakis(trifluorophosphine)iridium-Reference-Cited by-同舟云学术

Iridium CVD using di-Âµ-Chloro-tetrakis(trifluorophosphine)- diiridium (I) Precursor, in-situ generated from Chlorotetrakis(trifluorophosphine)iridium

Published:2009-12-07 Issue: Volume: Page:n/a-n/a
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Tran Phong Dinh,Barthes-Labrousse Marie-GeneviÃ¨ve,Doppelt Pascal

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/cvde.200906788/fullpdf

Reference30 articles.

1. Thermal stability of Ir/polycrystalline-Si structure for bottom electrode of integrated ferroelectric capacitors

2. Integration and electrical properties of diffusion barrier for high density ferroelectric memory

3. Preparation of Pb(Zr,Ti)O3thin films on electrodes including IrO2

4. Why is coordination chemistry stretching the limits of micro-electronics technology?

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Influence of Substrate Materials on Nucleation and Properties of Iridium Thin Films Grown by ALD;Coatings;2021-02-02

2. Crystal Structure and Properties of Iridium(I)(1,5-Cyclooctadiene) (η5-Tetramethylcyclopentadiene) [Ir(cod)CpMe4];Journal of Structural Chemistry;2020-03

3. Chemical vapour deposition of Ir-based coatings: chemistry, processes and applications;RSC Advances;2015

4. Chemical Vapor Deposition of Iridium and Rhodium Coatings from Hydridotetrakis(trifluorophosphine) Complexes;JOM;2012-06

5. Advances in the deposition chemistry of metal-containing thin films using gas phase processes;Chem. Sci.;2012