Low-Pressure PECVD of Nanoparticles in Carbon Thin Films from Ar/H2/C2H2 Plasmas: Synthesis of Films and Analysis of the Electron Energy Distribution Function-Reference-Cited by-同舟云学术

Low-Pressure PECVD of Nanoparticles in Carbon Thin Films from Ar/H2/C2H2 Plasmas: Synthesis of Films and Analysis of the Electron Energy Distribution Function

Published:2007-07 Issue:6-7 Volume:13 Page:326-334
ISSN:0948-1907
Container-title:Chemical Vapor Deposition
language:en
Short-container-title:Chem. Vap. Deposition

Author:

Camero M.,Gordillo-Vázquez F. J.,Gómez-Aleixandre C.

Publisher

Wiley

Subject

Process Chemistry and Technology,Surfaces and Interfaces,General Chemistry

Reference50 articles.

1. Fullerenes as precursors for diamond film growth without hydrogen or oxygen additions

2. Spectroscopic determination of carbon dimer densities in and plasmas

3. Spectroscopic diagnostics and modeling of Ar∕H2∕CH4 microwave discharges used for nanocrystalline diamond deposition

4. Comparison of a-C:H films deposited from methane–argon and acetylene–argon mixtures by electron cyclotron resonance–chemical vapor deposition discharges

5. Crystalline diamond growth in thin films deposited from a CH4/Ar rf plasma

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