Comparison of a-C:H films deposited from methane–argon and acetylene–argon mixtures by electron cyclotron resonance–chemical vapor deposition discharges-Reference-Cited by-同舟云学术

Comparison of a-C:H films deposited from methane–argon and acetylene–argon mixtures by electron cyclotron resonance–chemical vapor deposition discharges

Published:2000-01 Issue:1 Volume:9 Page:37-47
ISSN:0925-9635
Container-title:Diamond and Related Materials
language:en
Short-container-title:Diamond and Related Materials

Author:

Kim B.K.,Grotjohn T.A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Materials Chemistry,Mechanical Engineering,General Chemistry,Electronic, Optical and Magnetic Materials

Reference28 articles.

1. Deposition of diamond-like carbon

2. Effects of bias and inert gas on properties of diamond-like carbon deposited by d.c. PACVD

3. Plasma Deposition, Properties and Structure of Amorphous Hydrogenated Carbon Films

4. DC bias effects in the deposition of a-C:H films using the screen-grid method in electron cyclotron resonance chemical vapour deposition

5. Effect of negative bias voltage on a-C:H films deposited in electron cyclotron resonance plasma

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