Calamitic Blatter Radicals for Large‐Area Solution‐Coated Resistive Memories

Author:

Hou Yan1,Chen Hanjiao2,Lian Wenru1,Li Huaqing1,Hu Xiaoguang1ORCID,Liu Xuying1ORCID

Affiliation:

1. School of Materials Science and Engineering State Key Laboratory of Structural Analysis Optimization and CAE Software for Industrial Equipment Zhengzhou University Zhengzhou 450001 China

2. Analytical & Testing Center Sichuan University Chengdu 610064 China

Abstract

AbstractRadical molecules exhibit fast redox kinetics, are widely explored for data processing and energy storage. However, the insulating aliphatic matrix isolates the radical units, thus resulting in a weak charge transporting ability. Herein, calamitic Blatter radicals (CBR) with highly conductive [1]benzothieno[3,2‐b]benzothiophene (BTBT) as the conjugated backbone are designed and synthesized. It is found that bistable redox character associated with large conjugated backbone allows these Blatter radical derivatives to be switched with ON/OFF ratio reaching 106 and retention time exceeding 104 s in solution processed devices. In addition, these radicals are unveiled to perform tunable, multi‐mode field‐responsive resistance behaviors, including write‐once‐read‐many (WORM), FLASH, and dynamic random access memory (DRAM), by molecular engineering strategy. This finding provides fundamental understanding for charge transferring dynamics and redox‐switching mechanism of radical molecules with respect to electronic applications.

Funder

National Natural Science Foundation of China

Publisher

Wiley

Subject

Electrochemistry,Condensed Matter Physics,Biomaterials,Electronic, Optical and Magnetic Materials

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