Study of precursor chemistry and solvent systems in pp-MOCVD processing with alumina case study-Reference-Cited by-同舟云学术

Study of precursor chemistry and solvent systems in pp-MOCVD processing with alumina case study

Published:2015-06-03 Issue:7 Volume:212 Page:1519-1526
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Gunby Nathaniel R.¹,Krumdieck Susan²,Murthy Hari²,Masters Sarah L.¹,Miya Senzo S.²

Affiliation:

1. Department of Chemistry, Private Bag 4800; University of Canterbury; Christchurch 8041 New Zealand

2. Department of Mechanical Engineering, Private Bag 4800; University of Canterbury; Christchurch 8041 New Zealand

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference26 articles.

1. Local Kinetic Modeling of Aluminum Oxide Metal-Organic CVD From Aluminum Tri-isopropoxide

2. Investigation of titanium nitride gates for tantalum pentoxide and titanium dioxide dielectrics

3. High-κ gate dielectrics: Current status and materials properties considerations

4. Chemical deposition of Al2O3 thin films on Si substrates

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