Nitrogen enhanced thermal stability of nickel monosilicide-Reference-Cited by-同舟云学术

Nitrogen enhanced thermal stability of nickel monosilicide

Published:2017-01-10 Issue:5 Volume:214 Page:1600710
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Zuruzi A. S.¹,Chi D. Z.²,Mangelinck D.³

Affiliation:

1. Faculty of Engineering; Universiti Teknologi Brunei; Jalan Tungku Link Gadong BE1410 Brunei Darussalam

2. Institute of Materials Research and Engineering; Agency for Science, Technology and Research; 3 Research link Singapore 117602 Singapore

3. Faculté de saint Jérôme; Institut Matériaux Microélectronique Nanosciences de Provence (IM2NP); CNRS UMR 7334, Case 151 13397 Marseille Cedex 20 France

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference29 articles.

1. Nanowire Transistor Performance Limits and Applications

2. Future of nano CMOS technology

3. Optimized material solutions for advanced DRAM peripheral transistors

4. High performance horizontal gate-all-around silicon nanowire field-effect transistors

5. Top–Down Fabrication of Gate-All-Around Vertically Stacked Silicon Nanowire FETs With Controllable Polarity

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