Investigation of Microwave Plasma during Diamond Doping by Phosphorus Using Optical Emission Spectroscopy-Reference-Cited by-同舟云学术

Investigation of Microwave Plasma during Diamond Doping by Phosphorus Using Optical Emission Spectroscopy

Published:2019-07-24 Issue:21 Volume:216 Page:1900234
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Lobaev Mikhail Aleksandrovich¹^ORCID,Radishev Dmitry Borisovich¹,Gorbachev Alexey Mikhailovich¹,Vikharev Anatoly Leontievich¹,Drozdov Mikhail Nikolaevich¹²

Affiliation:

1. Department of Plasma Technology PhysicsInstitute of Applied Physics RAS 46 Ul'yanov Street Nizhny Novgorod 603950 Russia

2. Department for Technology of Nanostructures and DevicesInstitute for Physics of Microstructures RAS Academicheskaya Street 7, Afonino, Nizhny Novgorod Region, Kstovsky District Kstovo Region 603087 Russia

Funder

Russian Science Foundation

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.201900234

Reference36 articles.

1. Growth and characterization of phosphorous doped {111} homoepitaxial diamond thin films

2. Growth and characterization of phosphorus-doped diamond using organophosphorus gases

3. n-type CVD diamond doped with phosphorus using the MOCVD technology for dopant incorporation

4. Ab initio energetics of phosphorus impurity in subsurface regions of hydrogenated diamond surfaces

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