Investigation of silicon-vacancy center formation during the CVD diamond growth of thin and delta doped layers

Author:

Lobaev Mikhail A.12345ORCID,Gorbachev Alexey M.123,Radishev Dmitry B.12345,Vikharev Anatoly L.12345,Bogdanov Sergey A.12345,Isaev Vladimir A.12345,Drozdov Mikhail N.123

Affiliation:

1. Federal Research Center “Institute of Applied Physics RAS”

2. Nizhny Novgorod

3. Russia

4. Federal Research Center “Kazan Scientific Center of RAS”

5. Kazan

Abstract

A study of the process of diamond doping with silicon during CVD growth is presented. As a result, for the first time, a silicon-doped delta layer with a thickness of 5 nm and a depth localization accuracy of several nanometers was demonstrated.

Funder

Kazan Federal University

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

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