Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon-Reference-Cited by-同舟云学术

Diffusion of Phosphorus and Boron from Atomic Layer Deposition Oxides into Silicon

Published:2019-08-07 Issue:17 Volume:216 Page:1900306
ISSN:1862-6300
Container-title:physica status solidi (a)
language:en
Short-container-title:Phys. Status Solidi A

Author:

Beljakowa Svetlana¹^ORCID,Pichler Peter¹²,Kalkofen Bodo³,Hübner René⁴

Affiliation:

1. Chair of Electron DevicesUniversity Erlangen-Nuremberg Cauerstrasse 6 Erlangen 91058 Germany

2. Fraunhofer Institute of Integrated Systems and Device Technology IISB Schottkystrasse 10 Erlangen 91058 Germany

3. Institute for Micro and Sensor Systems (IMOS)University of Magdeburg Universitaetsplatz 2 Magdeburg 39106 Germany

4. Helmholtz-Zentrum Dresden - Rossendorf (HZDR)Institute of Ion Beam Physics and Materials Research Bautzner Landstrasse 400 Dresden 01328 Germany

Funder

Deutsche Forschungsgemeinschaft

Publisher

Wiley

Subject

Materials Chemistry,Electrical and Electronic Engineering,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/pssa.201900306

Reference49 articles.

1. Applications of Nanomaterials

2. Advances on doping strategies for triple-gate finFETs and lateral gate-all-around nanowire FETs and their impact on device performance

3. Considerations for Ultimate CMOS Scaling

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Atomic-layer-deposited BOx/Al2O3 stack for crystalline silicon surface passivation;Solar Energy Materials and Solar Cells;2023-09

2. Investigation of phosphorus-doping of MgZnO thin films using efficient spin-on dopant process;Journal of Luminescence;2023-05

3. Estimation of Phosphorus Concentration in Silicon Thin Film on Glass Using ToF-SIMS;MASS SPECTROM LETT;2021

4. Strategies and implications of atomic layer deposition in photoelectrochemical water splitting: Recent advances and prospects;Nano Energy;2021-05

5. Boron Detection Technique in Silicon Thin Film Using Dynamic Time of Flight Secondary Ion Mass Spectrometry;MASS SPECTROM LETT;2021