Author:
Laxman Ravi K.,Hochberg Arthur K.,Roberts David A.,Vrtis Raymond N.,Ovalle Saul
Subject
General Chemical Engineering,Electronic, Optical and Magnetic Materials
Cited by
6 articles.
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1. Simultaneous quantification of light elements in thin films deposited on Si substrates using proton EBS (Elastic Backscattering Spectroscopy);Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2014-08
2. Quantification of low levels of fluorine content in thin films;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2012-03
3. Fluorine content of SiOF films as determined by IR spectroscopy and resonant nuclear reaction analysis;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2007-05
4. Molecular-ion-beam-assisted deposition of stable SiOF films;SPIE Proceedings;2004-02-25
5. Thin-Film Deposition Materials;Handbook of Chemicals and Gases for the Semiconductor Industry;2002-07-15