A flexible and efficient approach to E-beam proximity effect correction

A flexible and efficient approach to E-beam proximity effect correction—PYRAMID

Published:2005 Issue:11 Volume:37 Page:919-926
ISSN:0142-2421
Container-title:Surface and Interface Analysis
language:en
Short-container-title:Surf. Interface Anal.

Author:

Lee Soo-Young

Publisher

Wiley

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference24 articles.

1. Proximity effect in electron‐beam lithography

2. Simulation of electron scattering in complex nanostructures: lithography, metrology, and characterization, Ph.D. Dissertation, Cornell University, 1992.

3. A study of proximity effects at high electron-beam voltages for x-ray mask fabrication. I. Additive mask processes

4. Methods for proximity effect correction in electron lithography

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