Mechanism for Local‐Atomic Structure Changes in Chalcogenide‐based Threshold‐Switching Devices

Author:

Choi Minwoo1ORCID,Sung Ha‐Jun1,Koo Bonwon1,Park Jong‐Bong1,Yang Wooyoung1,Kang Youngjae1ORCID,Park Yongyoung1,Ham Yongnam1,Yun Dong‐Jin2,Ahn Dongho3,Yang Kiyeon1ORCID,Lee Chang Seung1

Affiliation:

1. Thin Film Technical Unit Samsung Advanced Institute of Technology (SAIT) Samsung Electronics Suwon‐si 16677 South Korea

2. Analytical Engineering Group Samsung Advanced Institute of Technology (SAIT) Samsung Electronics Suwon‐si 16677 South Korea

3. Semiconductor R&D Center Samsung Electronics Hwaseong‐si 18448 South Korea

Abstract

AbstractThreshold‐switching devices based on amorphous chalcogenides are considered for use as selector devices in 3D crossbar memories. However, the fundamental understanding of amorphous chalcogenide is hindered owing to the complexity of the local structures and difficulties in the trap analysis of multinary compounds. Furthermore, after threshold switching, the local structures gradually evolve to more stable energy states owing to the unstable homopolar bonds. Herein, based on trap analysis, DFT simulations, and operando XPS analysis, it is determined that the threshold switching mechanism is deeply related to the charged state of Se–Se homopolar defects. A threshold switching device is demonstrated with an excellent performance through the modification of the local structure via the addition of alloying elements and investigating the time‐dependent trap evolution. The results concerning the trap dynamics of local atomic structures in threshold switching phenomena may be used to improve the design of amorphous chalcogenides.

Funder

Samsung Advanced Institute of Technology

Publisher

Wiley

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