Application of Tougaard background subtraction to Auger spectra. I: Silicon, SiO2 and Si3N4
Author:
Publisher
Wiley
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference19 articles.
1. Inelastic background intensities in XPS spectra
2. Inelastic background removal in x‐ray excited photoelectron spectra from homogeneous and inhomogeneous solids
3. Low energy inelastic electron scattering properties of noble and transition metals
4. Quantitative analysis of the inelastic background in surface electron spectroscopy
5. Practical algorithm for background subtraction
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1. Use of XPS to clarify the Hall coefficient sign variation in thin niobium layers buried in silicon;Applied Surface Science;2017-03
2. Auger-photoelectron coincidence spectroscopy of SiO2;Journal of Electron Spectroscopy and Related Phenomena;2007-10
3. Quantitative surface analysis by Auger and x-ray photoelectron spectroscopy;Progress in Surface Science;1996-08
4. Estimation of Excitation Depth Distribution from Electron-excited Auger Spectra of Iron Using Peak Shape Analysis;Surface and Interface Analysis;1996-03
5. An examination of the use of principal component analysis and target factor analysis for the determination of Auger depth profiles in two magnetic multilayer metal systems—Cu/Co and Co/Pt;Surface and Interface Analysis;1995-12
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