Stoichiometric Control of SiOxThin Films Grown by Reactive Magnetron Sputtering at Oblique Angles-Reference-Cited by-同舟云学术

Stoichiometric Control of SiOxThin Films Grown by Reactive Magnetron Sputtering at Oblique Angles

Published:2016-08-02 Issue:12 Volume:13 Page:1242-1248
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process Polym

Author:

Garcia-Valenzuela Aurelio¹,Alvarez Rafael¹,Lopez-Santos Carmen¹,Ferrer Francisco J.²,Rico Victor¹,Guillen Elena³,Alcon-Camas Mercedes³,Escobar-Galindo Ramon³,Gonzalez-Elipe Agustin R.¹,Palmero Alberto¹

Affiliation:

1. Instituto de Ciencia de Materiales de Sevilla (CSIC-US); Americo Vespucio 49 41092 Seville Spain

2. Centro Nacional de Aceleradores (CSIC-US); Avda. Thomas A. Edison 7 41092 Seville Spain

3. Abengoa Research S. L.; Palmas Altas 41014 Seville Spain

Funder

Junta de Andalucía

Spanish Ministry of Economy and Competitiveness

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201600077/fullpdf

Reference40 articles.

1. Recent developments in plasma assisted physical vapour deposition

2. Reactive magnetron sputtering of transparent conductive oxide thin films: Role of energetic particle (ion) bombardment

3. Magnetron sputtering: a review of recent developments and applications

4. W. D. Westwood 2003 204

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Plasmas and acoustic waves to pattern the nanostructure and chemistry of thin films;Acta Materialia;2023-08

2. Compositional gradients at the nanoscale in substoichiometric thin films deposited by magnetron sputtering at oblique angles: A case study on SiO x thin films;Plasma Processes and Polymers;2021-10

3. Chemistry and Electrocatalytic Activity of Nanostructured Nickel Electrodes for Water Electrolysis;ACS Catalysis;2020-05-05

4. Growth angle-dependent tunable work function and optoelectronic properties of MoOx thin films;Applied Surface Science;2020-03

5. SiOx by magnetron sputtered revisited: Tailoring the photonic properties of multilayers;Applied Surface Science;2019-09