Microwave PECVD Silicon Carbonitride Thin Films: A FTIR and Ellipsoporosimetry Study-Reference-Cited by-同舟云学术

Microwave PECVD Silicon Carbonitride Thin Films: A FTIR and Ellipsoporosimetry Study

Published:2015-06-08 Issue:2 Volume:13 Page:258-265
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process. Polym.

Author:

Haacké Mathias¹,Coustel Romain¹²,Rouessac Vincent¹,Roualdès Stéphanie¹,Julbe Anne¹

Affiliation:

1. Institut Européen des Membranes (ENSCM/UM/CNRS UMR5635); Université Montpellier - cc047; 2 Place Eugène Bataillon 34095 Montpellier Cedex 5 France

2. Laboratoire de Chimie Physique et Microbiologie pour l'Environnement (CNRS UMR 7564/Université de Lorraine); 405 rue de Vandœuvre 54601 Villers-lès-Nancy France

Funder

Region Languedoc-Roussillon and by BPI France

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201500058/fullpdf

Reference35 articles.

1. Mechanical and optical properties of hard SiCN coatings prepared by PECVD

2. A Novel Organosilicon Source for Low Temperature Plasma Deposition of Silicon Nitride-like Thin Films

3. Three-Dimensional SiCN Ceramic Microstructures via Nano-Stereolithography of Inorganic Polymer Photoresists

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