A Novel Organosilicon Source for Low Temperature Plasma Deposition of Silicon Nitride-like Thin Films
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Reference23 articles.
1. The preparation, characterization and applications of silicon nitride thin films
2. “Handbook of Thin Films Deposition Processes and Techniques”, Noyes, Park Ridge, NJ 1988.
3. Characterization of Silicon Nitride Films
4. Kinetics and Compositional Dependence on the Microwave Power and SiH4 / N 2 Flow Ratio of Silicon Nitride Deposited by Electron Cyclotron Resonance Plasmas
5. Low hydrogen content stoichiometric silicon nitride films deposited by plasma‐enhanced chemical vapor deposition
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