Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure-Reference-Cited by-同舟云学术

Evolution of photoresist layer structure and surface morphology under fluorocarbon‐based plasma exposure

Published:2019-03-29 Issue:9 Volume:16 Page:1900026
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process Polym

Author:

Pranda Adam¹^ORCID,Gutierrez Razo Sandra A.²,Fourkas John T.²³⁴,Oehrlein Gottlieb S.¹

Affiliation:

1. Department of Materials Science and Engineering, Institute for Research in Electronics and Applied Physics University of Maryland College Park Maryland

2. Department of Chemistry and Biochemistry University of Maryland College Park Maryland

3. Institute for Physical Science and Technology University of Maryland College Park Maryland

4. Center for Nanophysics and Advanced Materials University of Maryland College Park Maryland

Funder

Division of Civil, Mechanical and Manufacturing Innovation

Fusion Energy Sciences

National Science Foundation

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

https://onlinelibrary.wiley.com/doi/pdf/10.1002/ppap.201900026

Reference57 articles.

1. Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma

2. Real-time and post-plasma studies of influence of low levels of tungsten on carbon erosion and surface evolution behaviour in D2plasma

3. Formation of nanometer-thick delaminated amorphous carbon layer by two-step plasma processing of methacrylate-based polymer

4. Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties

5. Plasma-polymer interactions: A review of progress in understanding polymer resist mask durability during plasma etching for nanoscale fabrication

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Water-soluble bio-sourced resist interactions with fluorinated etching plasmas during the photolithography process;Journal of Vacuum Science & Technology B;2023-10-31

2. Atomic and close-to-atomic scale polishing of Lu2O3 by plasma-assisted etching;International Journal of Mechanical Sciences;2023-08

3. Transparent Antireflective (AR) Surfaces Inspired by Cicada Wings;Nature‐Inspired Structured Functional Surfaces;2022-07-22

4. Multiple regression analysis of postdevelop unbiased line width roughness and etch resistance for high-accuracy estimations of postetch pattern roughness;Journal of Micro/Nanopatterning, Materials, and Metrology;2022-05-14

5. Significance of plasma-photoresist interactions for atomic layer etching processes with extreme ultraviolet photoresist;Journal of Vacuum Science & Technology A;2020-09