Generation of Positive and Negative Oxygen Ions in Magnetron Discharge During Reactive Sputtering of Alumina
Author:
Publisher
Wiley
Subject
Polymers and Plastics,Condensed Matter Physics
Reference17 articles.
1. Reactive d.c. high-rate sputtering as production technology
2. Recent aspects concerning DC reactive magnetron sputtering of thin films: a review
3. Reactive magnetron sputtering of thin films: present status and trends
4. Control of reactive sputtering processes
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1. Flux of High-Energy Positive Oxygen Ions from Plasma to a Substrate in a Pulsed Magnetron Discharge with a Hot Target;Journal of Communications Technology and Electronics;2023-10
2. Flow of high-energy positive oxygen ions from plasma onto the substrate in a pulsed magnetron discharge with a hot target.;Радиотехника и электроника;2023-10-01
3. The measurement and impact of negative oxygen ions during reactive sputter deposition;Critical Reviews in Solid State and Materials Sciences;2023-09-21
4. Evidence of 1000 eV positive oxygen ion flux generated in reactive HiPIMS plasma;Plasma Sources Science and Technology;2023-06-01
5. Surface processes on thin layers of black aluminum in ultra-high vacuum;Vacuum;2022-11
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