Synergistic effect of VUV photons and F atoms on damage and etching of porous organosilicate films-Reference-Cited by-同舟云学术

Synergistic effect of VUV photons and F atoms on damage and etching of porous organosilicate films

Published:2018-02-19 Issue:4 Volume:15 Page:1700213
ISSN:1612-8850
Container-title:Plasma Processes and Polymers
language:en
Short-container-title:Plasma Process Polym

Author:

Lopaev Dmitry V.¹^ORCID,Zyryanov Sergey M.¹²,Zotovich Alexey I.¹²,Rakhimova Tatyana V.¹,Mankelevich Yury A.¹,Rakhimov Alexander T.¹,Baklanov Mikhail R.³

Affiliation:

1. Skobeltsyn Institute of Nuclear Physics; Moscow State University; Moscow Russia

2. Faculty of Physics; Moscow State University; Moscow Russia

3. Department of Microelectronics; North China University of Technology; Beijing People's Republic of China

Funder

Russian Science Foundation

Publisher

Wiley

Subject

Polymers and Plastics,Condensed Matter Physics

Link

http://onlinelibrary.wiley.com/wol1/doi/10.1002/ppap.201700213/fullpdf

Reference42 articles.

1. Continuous formation of supported cubic and hexagonal mesoporous films by sol–gel dip-coating

2. Formation of Novel Oriented Transparent Films of Layered Silica-Surfactant Nanocomposites

3. A New Phase of Oriented Mesoporous Silicate Thin Films

4. Periodic Mesoporous Organosilicas: from simple to complex bridges; a comprehensive overview of functions, morphologies and applications

5. Advanced Interconnects for ULSI Technology

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